Invention Grant
- Patent Title: Non-volatile memory device including phase-change material
- Patent Title (中): 包括相变材料的非易失性存储器件
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Application No.: US12657715Application Date: 2010-01-26
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Publication No.: US08222625B2Publication Date: 2012-07-17
- Inventor: Dong-ho Ahn , Hideki Horii , Soon-oh Park , Young-hyun Kim , Hee-ju Shin , Jin-ho Oh , Carl H. Schell , Jonathan D. Maimon , Stephen J. Hudgens
- Applicant: Dong-ho Ahn , Hideki Horii , Soon-oh Park , Young-hyun Kim , Hee-ju Shin , Jin-ho Oh , Carl H. Schell , Jonathan D. Maimon , Stephen J. Hudgens
- Applicant Address: KR US MI Rochester Hills
- Assignee: Samsung Electronics Co., Ltd.,Ovonyx, Inc.
- Current Assignee: Samsung Electronics Co., Ltd.,Ovonyx, Inc.
- Current Assignee Address: KR US MI Rochester Hills
- Agency: Onello & Mello, LLP
- Priority: KR10-2009-0079766 20090827
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A non-volatile memory device including a phase-change material, which has a low operating voltage and low power consumption, includes a lower electrode; a phase-change material layer formed on the lower electrode so as to be electrically connected to the lower electrode, wherein the phase-change material layer includes a phase-change material having a composition represented by SnXSbYTeZ or, alternatively with substitutions, in whole or in part, of silicon and/or indium for tin, arsenic and/or bismuth for antimony, and selenium for tellurium; and an upper electrode formed on the phase-change material layer so as to be electrically connected to the phase-change material layer. Here, 0.001≦X≦0.3, 0.001≦Y≦0.8, 0.1≦Z≦0.8, and X+Y+Z=1.
Public/Granted literature
- US20110049458A1 Non-volatile memory device including phase-change material Public/Granted day:2011-03-03
Information query
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