Invention Grant
- Patent Title: Image sensor and method of fabricating the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US13096355Application Date: 2011-04-28
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Publication No.: US08222708B2Publication Date: 2012-07-17
- Inventor: Yun-Ki Lee
- Applicant: Yun-Ki Lee
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2008-0134597 20081226
- Main IPC: H01L21/02
- IPC: H01L21/02
Abstract:
An image sensor and a method of fabricating the same are provided. A pad region is disposed on a substrate. The pad region has a higher concentration of impurity ions than the substrate. The pad region is selectively removed using the substrate as an etch mask, thereby forming a hole. A conductive pad is formed in the hole of the substrate.
Public/Granted literature
- US20110198717A1 IMAGE SENSOR AND METHOD OF FABRICATING THE SAME Public/Granted day:2011-08-18
Information query
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