Invention Grant
- Patent Title: Semiconductor device and manufacturing method of the semiconductor device
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US12688029Application Date: 2010-01-15
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Publication No.: US08222744B2Publication Date: 2012-07-17
- Inventor: Yoshimichi Harada , Makoto Murai , Takayuki Tanaka , Takuya Nakamura
- Applicant: Yoshimichi Harada , Makoto Murai , Takayuki Tanaka , Takuya Nakamura
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JP2009-010786 20090121
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/00

Abstract:
A semiconductor device includes: a mounted body in which a wiring pattern is formed on a first main surface; a semiconductor chip mounted on the surface of the mounted body on which the wiring pattern is formed; an underfill material which is filled between the mounted body and the semiconductor chip and forms a fillet on an outer peripheral part of the semiconductor chip; and an injection section which is disposed on the mounted body and on an outside of a side section, on which the fillet is formed to be longest, of four side sections defining a chip mount area on which the semiconductor chip is mounted, and guides the underfill material to between the mounted body and the semiconductor chip.
Public/Granted literature
- US20100181680A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR DEVICE Public/Granted day:2010-07-22
Information query
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