Invention Grant
US08222988B2 Porous device for optical and electronic applications and method of fabricating the porous device
有权
用于光学和电子应用的多孔器件和制造多孔器件的方法
- Patent Title: Porous device for optical and electronic applications and method of fabricating the porous device
- Patent Title (中): 用于光学和电子应用的多孔器件和制造多孔器件的方法
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Application No.: US12462297Application Date: 2009-07-30
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Publication No.: US08222988B2Publication Date: 2012-07-17
- Inventor: Paul V. Braun , James J. Coleman , Victor C. Elarde , Erik C. Nelson , Varun B. Verma
- Applicant: Paul V. Braun , James J. Coleman , Victor C. Elarde , Erik C. Nelson , Varun B. Verma
- Applicant Address: US IL Urbana
- Assignee: The Board of Trustees of the University of Illinois
- Current Assignee: The Board of Trustees of the University of Illinois
- Current Assignee Address: US IL Urbana
- Agency: Brinks Hofer Gilson & Lione
- Main IPC: H01C7/10
- IPC: H01C7/10

Abstract:
A porous device for optical and electronic applications comprises a single crystal substrate and a porous single crystal structure epitaxially disposed on the substrate, where the porous single crystal structure includes a three-dimensional arrangement of pores. The three-dimensional arrangement may also be a periodic arrangement. A method of fabricating such a device includes forming a scaffold comprising interconnected elements on a single crystal substrate, where the interconnected elements are separated by voids. A first material is grown epitaxially on the substrate and into the voids. The scaffold is then removed to obtain a porous single crystal structure epitaxially disposed on the substrate, where the single crystal structure comprises the first material and includes pores defined by the interconnected elements of the scaffold.
Public/Granted literature
- US20100065889A1 Porous device for optical and electronic applications and method of fabricating the porous device Public/Granted day:2010-03-18
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