Invention Grant
- Patent Title: D/A converter and electron beam exposure apparatus
- Patent Title (中): D / A转换器和电子束曝光装置
-
Application No.: US12800568Application Date: 2010-05-18
-
Publication No.: US08223045B2Publication Date: 2012-07-17
- Inventor: Hidefumi Yabara
- Applicant: Hidefumi Yabara
- Applicant Address: JP Tokyo
- Assignee: Advantest Corp.
- Current Assignee: Advantest Corp.
- Current Assignee Address: JP Tokyo
- Agency: Muramatsu & Associates
- Main IPC: H03M1/06
- IPC: H03M1/06

Abstract:
A D/A converter includes a D/A converter base part having a first D/A converter unit performing D/A conversion of high order bits and a second D/A converter unit performing D/A conversion of low order bits and including an auxiliary bit assigned an identical weight to a least significant bit, a correction D/A converter part, an error detection processing section generating a digital code supplied to a correction D/A converter unit in the correction D/A converter part, and a control section. The control section compares one bit current source with another bit current source in a lower order than the one bit current source, and corrects a value of the one bit current source by causing to supply the digital code to the correction D/A converter unit when the value of the one bit current source changes.
Public/Granted literature
- US20100314560A1 D/A Converter and electron beam exposure apparatus Public/Granted day:2010-12-16
Information query