Invention Grant
- Patent Title: Method of manufacturing a display device using a barrier layer to form an ohmic contact layer
- Patent Title (中): 制造使用阻挡层形成欧姆接触层的显示装置的方法
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Application No.: US12701766Application Date: 2010-02-08
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Publication No.: US08223312B2Publication Date: 2012-07-17
- Inventor: Xiang Liu
- Applicant: Xiang Liu
- Applicant Address: CN Beijing
- Assignee: Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee: Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN200910077487 20090213
- Main IPC: G02F1/136
- IPC: G02F1/136 ; G02F1/13

Abstract:
An embodiment of the invention provides a thin film transistor liquid crystal display (TFT-LCD) array substrate comprising: a gate line and a data line that intersect with each other to define a pixel region; and a pixel electrode and a thin film transistor formed in the pixel region. The thin film transistor comprises: a gate electrode connected with the gate line; a semiconductor island positioned above the gate electrode; and a source electrode and a drain electrode that are formed on the semiconductor island. A surface of the semiconductor island contacting with the source electrode and the drain electrode comprises ohmic contact regions subject to a surface treatment and a region of the semiconductor layer between the source electrode and the drain electrode is covered with a barrier layer. Another embodiment of the invention provides a method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) array substrate.
Public/Granted literature
- US20100208156A1 TFT-LCD ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-08-19
Information query
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