Invention Grant
- Patent Title: Light intensity distribution measurement apparatus and measurement method, and exposure apparatus
- Patent Title (中): 光强度分布测定装置及测定方法以及曝光装置
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Application No.: US12353541Application Date: 2009-01-14
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Publication No.: US08223313B2Publication Date: 2012-07-17
- Inventor: Akinori Ohkubo
- Applicant: Akinori Ohkubo
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2008-007205 20080116
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A measurement apparatus which illuminates a pattern inserted on the object plane of an optical system, and measures a light intensity distribution corresponding to the pattern formed on the image plane of the optical system includes a sensor. The sensor includes a light-shielding member having a slit and a plurality of light-receiving units, wherein the light-shielding member is inserted on the image plane of the optical system and rotates and scans, and the plurality of light-receiving units receive light transmitted through the slit. The measurement apparatus controls rotation of the light-shielding member, on the basis of the positional relationship between the plurality of light-receiving units, and the phase differences between the signals detected by the plurality of light-receiving units arising from the scan of the light-shielding member.
Public/Granted literature
- US20090180094A1 LIGHT INTENSITY DISTRIBUTION MEASUREMENT APPARATUS AND MEASUREMENT METHOD, AND EXPOSURE APPARATUS Public/Granted day:2009-07-16
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