Invention Grant
- Patent Title: Method for measuring wavefront aberration
- Patent Title (中): 波前像差测量方法
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Application No.: US12507159Application Date: 2009-07-22
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Publication No.: US08223314B2Publication Date: 2012-07-17
- Inventor: Kazuki Yamamoto
- Applicant: Kazuki Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2008-195313 20080729
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A method comprises determining a first processing center position to calculate a wavefront aberration of an optical system, determining a second processing center position to calculate a wavefront aberration, correcting the first processing center position in a first direction using the second processing center position in the first direction and correcting the second processing center position in a second direction using the first processing center position in the second direction.
Public/Granted literature
- US20100026977A1 METHOD FOR MEASURING WAVEFRONT ABERRATION Public/Granted day:2010-02-04
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