Invention Grant
- Patent Title: Measuring apparatus and exposure apparatus having the same
- Patent Title (中): 测量装置和具有该测量装置的曝光装置
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Application No.: US12434095Application Date: 2009-05-01
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Publication No.: US08223315B2Publication Date: 2012-07-17
- Inventor: Yumiko Ohsaki
- Applicant: Yumiko Ohsaki
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2005-040271 20050217
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/72
Abstract:
A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system under test to 0.6 or less, and a detector for detecting an interference fringes formed by the light that passes through the numerical aperture decreasing part.
Public/Granted literature
- US20090274964A1 MEASURING APPARATUS AND EXPOSURE APPARATUS HAVING THE SAME Public/Granted day:2009-11-05
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