An exposure apparatus includes an optical path in which a plurality of optical units are arranged and which includes a portion of projecting a pattern of an original onto a substrate to expose the substrate to light, and a controller configured to monitor deteriorations, due to light, of the plurality of optical units, wherein the controller is configured to monitor each of a plurality of sections of the optical path each of which includes at least one optical unit, for deterioration of the at least one optical unit belonging to a corresponding section.