Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method controlling shutter based on intensity of reflected light
- Patent Title (中): 基于反射光强度控制快门的曝光装置和装置制造方法
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Application No.: US11956597Application Date: 2007-12-14
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Publication No.: US08223317B2Publication Date: 2012-07-17
- Inventor: Shinichi Hirano
- Applicant: Shinichi Hirano
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-339204 20061215
- Main IPC: G03B27/72
- IPC: G03B27/72
Abstract:
An exposure apparatus for exposing a substrate to radiant energy includes a holder configured to hold the substrate, a shutter for regulating exposure time for the substrate, and a controller configured to control an operation of the shutter. The controller is configured to control the operation of the shutter based on information having a correlation with intensity of light reflected from the holder and the substrate held by the holder.
Public/Granted literature
- US20080143990A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-06-19
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