Invention Grant
- Patent Title: Illuminating optical apparatus, exposure apparatus and device manufacturing method
- Patent Title (中): 照明光学装置,曝光装置及装置的制造方法
-
Application No.: US12243393Application Date: 2008-10-01
-
Publication No.: US08223318B2Publication Date: 2012-07-17
- Inventor: Kouji Muramatsu , Hisashi Nishinaga
- Applicant: Kouji Muramatsu , Hisashi Nishinaga
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-188052 20060707
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/72

Abstract:
An illumination optical apparatus is able to quickly perform switching between polarization states of illumination light in a first region and in a second region. The illumination optical apparatus of the present invention for illuminating a surface to be illuminated on the basis of light from a light source is provided with an optical integrator of a wavefront division type arranged in an optical path between the light source and the surface to be illuminated and including a plurality of wavefront division regions; and a polarization changing member for changing a polarization state of at least one beam out of a beam incident to a first region in the wavefront division regions of the optical integrator and a beam incident to a second region in the wavefront division regions of the optical integrator.
Public/Granted literature
- US20090086186A1 ILLUMINATING OPTICAL APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-02
Information query