Invention Grant
US08223345B2 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method 有权
表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法

  • Patent Title: Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
  • Patent Title (中): 表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法
  • Application No.: US12426651
    Application Date: 2009-04-20
  • Publication No.: US08223345B2
    Publication Date: 2012-07-17
  • Inventor: Yasuhiro HidakaMotofusa Ishikawa
  • Applicant: Yasuhiro HidakaMotofusa Ishikawa
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Main IPC: G01B11/14
  • IPC: G01B11/14
Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
Abstract:
A surface position detecting apparatus comprises a light-sending optical system which makes first light from a first pattern and second light from a second pattern incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system which guides the first light and the second light reflected on the predetermined surface, to a first observation surface and to a second observation surface, respectively, to form an observation image of the first pattern on the first observation surface and an observation image of the second pattern on the second observation surface; and a detecting section which detects position information of the observation image of the first pattern on the first observation surface and position information of the observation image of the second pattern on the second observation surface and which calculates a surface position of the predetermined surface, based on the position information of the observation image of the first pattern and the position information of the observation image of the second pattern.
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