Invention Grant
US08224061B2 Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process
有权
用于执行用于多次曝光处理的图案分解的基于模型的着色处理的方法，程序产品和装置
- Patent Title: Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process
- Patent Title (中): 用于执行用于多次曝光处理的图案分解的基于模型的着色处理的方法，程序产品和装置
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Application No.: US12614208Application Date: 2009-11-06
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Publication No.: US08224061B2Publication Date: 2012-07-17
- Inventor: Robert John Socha
- Applicant: Robert John Socha
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A method of decomposing a target pattern containing features to be imaged onto a substrate into a plurality of exposure patterns for use in a multi-exposure process. The method includes dividing the target pattern into fragments; associating the fragments with an exposure pattern; associating the fragments with image log slope (ILS) evaluation points; and maximizing ILS values. Maximizing the ILS values further includes calculating ILS values at the ILS evaluation points; determining a minimum ILS value; calculating changes in the ILS values as a result of associating fragments with a different exposure pattern; determining a maximum change of the ILS values; and associating fragments associated with the maximum change with a different exposure pattern.
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