Invention Grant
- Patent Title: Contact type measurement device having fine contact force adjustment mechanism
- Patent Title (中): 具有接触力调节机构的接触式测量装置
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Application No.: US13033927Application Date: 2011-02-24
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Publication No.: US08225519B2Publication Date: 2012-07-24
- Inventor: Yonpyo Hon , Kenzo Ebihara , Masayuki Hamura
- Applicant: Yonpyo Hon , Kenzo Ebihara , Masayuki Hamura
- Applicant Address: JP Yamanashi
- Assignee: Fanuc Corporation
- Current Assignee: Fanuc Corporation
- Current Assignee Address: JP Yamanashi
- Agency: Lowe Hauptman Ham & Berner LLP
- Priority: JP2010-070837 20100325
- Main IPC: G01B5/00
- IPC: G01B5/00 ; G01B7/00 ; G01B13/00

Abstract:
A contact type measurement device performs measurement with displacement of a probe, while a contact member attached to the probe is in contact with an object to be measured. Data on the relationship of a contact force of the probe to the object to be measured with an angle between the central axis of the probe and the direction of gravity, the amount of displacement of the probe, and a fluid pressure for applying a pushing-out or pulling-in force to the probe is stored in advance and, on the basis of this data, the fluid pressure or the amount of displacement of the probe is controlled to automatically and precisely adjust a fine contact force of the probe to the object to be measured.
Public/Granted literature
- US20110232118A1 CONTACT TYPE MEASUREMENT DEVICE HAVING FINE CONTACT FORCE ADJUSTMENT MECHANISM Public/Granted day:2011-09-29
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