Invention Grant
- Patent Title: Coating apparatus and method
- Patent Title (中): 涂布装置及方法
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Application No.: US12394690Application Date: 2009-02-27
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Publication No.: US08225737B2Publication Date: 2012-07-24
- Inventor: Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
- Applicant: Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-126259 20080513
- Main IPC: B05C5/02
- IPC: B05C5/02

Abstract:
A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.
Public/Granted literature
- US20090285984A1 COATING APPARATUS AND METHOD Public/Granted day:2009-11-19
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