Invention Grant
US08226895B2 Reaction apparatus for producing trichlorosilane and method for producing trichlorosilane
有权
用于制备三氯硅烷的反应装置和三氯硅烷的制备方法
- Patent Title: Reaction apparatus for producing trichlorosilane and method for producing trichlorosilane
- Patent Title (中): 用于制备三氯硅烷的反应装置和三氯硅烷的制备方法
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Application No.: US12289209Application Date: 2008-10-22
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Publication No.: US08226895B2Publication Date: 2012-07-24
- Inventor: Chikara Inaba
- Applicant: Chikara Inaba
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Materials Corporation
- Current Assignee: Mitsubishi Materials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edwards Wildman Palmer LLP
- Priority: JPP2007-277787 20071025
- Main IPC: B01J8/24
- IPC: B01J8/24 ; B01J8/34 ; B01J8/38 ; C01B33/107

Abstract:
A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port.
Public/Granted literature
- US20090123359A1 Reaction apparatus for producing trichlorosilane and method for producing trichlorosilane Public/Granted day:2009-05-14
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