Invention Grant
- Patent Title: Method of manufacturing piezoelectric thin film
- Patent Title (中): 制造压电薄膜的方法
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Application No.: US12131454Application Date: 2008-06-02
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Publication No.: US08227021B2Publication Date: 2012-07-24
- Inventor: Makoto Kubota , Motokazu Kobayashi , Shinji Eritate , Fumio Uchida , Kenji Maeda , Chiemi Shimizu
- Applicant: Makoto Kubota , Motokazu Kobayashi , Shinji Eritate , Fumio Uchida , Kenji Maeda , Chiemi Shimizu
- Applicant Address: JP Tokyo JP Osaka-shi
- Assignee: Canon Kabushiki Kaisha,Fuji Chemical Co. Ltd.
- Current Assignee: Canon Kabushiki Kaisha,Fuji Chemical Co. Ltd.
- Current Assignee Address: JP Tokyo JP Osaka-shi
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2004-055479 20040227
- Main IPC: B05D5/12
- IPC: B05D5/12 ; H01L41/22

Abstract:
There are disclosed a piezoelectric thin film having less non-uniform portions and holding satisfactory piezoelectric characteristics, a method of manufacturing the film, a piezoelectric element using the piezoelectric thin film, and an ink jet system recording head using the piezoelectric element. In the piezoelectric thin film of perovskite crystals formed on a substrate by a sol-gel process and represented by a general formula Pb(1−x)Lax(ZryTi1−y)O3 (where 0≦x
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