Invention Grant
US08227169B2 Compound, acid generator, resist composition, and method of forming resist pattern
有权
化合物，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
- Patent Title: Compound, acid generator, resist composition, and method of forming resist pattern
- Patent Title (中): 化合物，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US12450060Application Date: 2008-04-04
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Publication No.: US08227169B2Publication Date: 2012-07-24
- Inventor: Akiya Kawaue , Yoshiyuki Utsumi , Takehito Seo , Hideo Hada , Kotaro Endo , Daisuke Kawana , Yasuhiro Yoshii , Tsuyoshi Kurosawa
- Applicant: Akiya Kawaue , Yoshiyuki Utsumi , Takehito Seo , Hideo Hada , Kotaro Endo , Daisuke Kawana , Yasuhiro Yoshii , Tsuyoshi Kurosawa
- Applicant Address: JP Kanagawa
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPP2007-108453 20070417; JPP2007-150586 20070606; JPP2007-275654 20071023
- International Application: PCT/JP2008/056780 WO 20080404
- International Announcement: WO2008/132966 WO 20081106
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07C309/06
Abstract:
There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: R2—CH2—O—Y1—SO3−A+ (b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A+ represents a cation.
Public/Granted literature
- US20100104973A1 COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2010-04-29
Information query
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