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US08227178B2 Manufacturing method of planar optical waveguide device with grating structure 有权
具有光栅结构的平面光波导器件的制造方法

Manufacturing method of planar optical waveguide device with grating structure
Abstract:
A method for manufacturing a planar optical waveguide device including a core of which a top face is provided with a groove section filled with a groove section filler made of a low refractive index material having a refractive index lower than that of the core, the method including; a first high refractive index material layer forming step of forming a high refractive index material layer; a low refractive index material layer forming step of forming a low refractive index material layer made of the low refractive index material on the high refractive index material layer; a groove section filler forming step of forming the groove section filler by trimming both lateral portions of the low refractive index material layer; and a second high refractive index material layer forming step of forming a high refractive index material layer so as to fill the both sides of the lateral portions of the groove section filler.
Abstract(Chinese):

一种平面光波导器件的制造方法，其特征在于，具有芯部，其上表面设置有填充有折射率低于芯的低折射率材料的槽部填充物的槽部，该方法包括 ; 形成高折射率材料层的第一高折射率材料层形成步骤; 低折射率材料层形成步骤，在所述高折射率材料层上形成由所述低折射率材料制成的低折射率材料层; 槽部填料形成工序，通过对所述低折射率材料层的两个侧面进行修整而形成所述槽部填料; 以及形成高折射率材料层的第二高折射率材料层形成步骤，以便填充槽部填料的侧部的两侧。

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