Invention Grant
US08227267B2 Template inspection method and manufacturing method for semiconductor device 有权
半导体器件的模板检查方法和制造方法

Template inspection method and manufacturing method for semiconductor device
Abstract:
A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
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