Invention Grant
- Patent Title: Method for producing single crystal silicon solar cell and single crystal silicon solar cell
- Patent Title (中): 单晶硅太阳能电池和单晶硅太阳能电池的制造方法
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Application No.: US11976026Application Date: 2007-10-19
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Publication No.: US08227290B2Publication Date: 2012-07-24
- Inventor: Atsuo Ito , Shoji Akiyama , Masahiro Furuya , Makoto Kawai , Koichi Tanaka , Yoshihiro Kubota , Yuuji Tobisaka
- Applicant: Atsuo Ito , Shoji Akiyama , Masahiro Furuya , Makoto Kawai , Koichi Tanaka , Yoshihiro Kubota , Yuuji Tobisaka
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-294490 20061030
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for producing a single crystal silicon solar cell including the steps of: implanting ions into a single crystal silicon substrate through an ion implanting surface thereof; closely contacting the single crystal silicon substrate and a transparent insulator substrate with each other via a transparent adhesive while using the ion implanting surface as a bonding surface; curing the transparent adhesive; applying an impact to the ion implanted layer to mechanically delaminate the single crystal silicon substrate; forming a plurality of diffusion regions having a second conductivity type at the delaminated surface side of the single crystal silicon layer, such that a plurality of first conductivity-type regions and second conductivity-type regions are present at the delaminated surface of the single crystal silicon layer; forming pluralities of individual electrodes on the pluralities of first and second conductivity-type regions, respectively; and forming collector electrodes for the individual electrodes, respectively.
Public/Granted literature
- US20080099067A1 Method for producing single crystal silicon solar cell and single crystal silicon solar cell Public/Granted day:2008-05-01
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