Invention Grant
- Patent Title: Aromatic sulfonium salt compound
- Patent Title (中): 芳香锍盐化合物
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Application No.: US12672182Application Date: 2008-08-04
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Publication No.: US08227624B2Publication Date: 2012-07-24
- Inventor: Tetsuyuki Nakayashiki , Kentaro Kimura
- Applicant: Tetsuyuki Nakayashiki , Kentaro Kimura
- Applicant Address: JP Tokyo
- Assignee: Adeka Corporation
- Current Assignee: Adeka Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-205876 20070807
- International Application: PCT/JP2008/063952 WO 20080804
- International Announcement: WO2009/020089 WO 20090212
- Main IPC: C07D333/76
- IPC: C07D333/76 ; C07C381/12

Abstract:
A photoacid generator which can generate an acid efficiently when energy was absorbed, is excellent in the developing property and can form fine patterns, and a cationic polymerization initiator excellent in curability are provided; and a resist composition and a cationically polymerizable composition using them are provided.An aromatic sulfonium salt compound represented by the General Formula (I) below: (wherein each of E1 to E4 independently represents a substituent represented by the General Formula (II) below or the General Formula (III) below). Preferably, in the General Formula (I), r and s are 0; m and n are 0; or n and r are 0, and more preferably, one of m and s in the General Formula (I) is 1.
Public/Granted literature
- US20110152540A1 AROMATIC SULFONIUM SALT COMPOUND Public/Granted day:2011-06-23
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