Invention Grant
US08227706B2 Coaxial plated through holes (PTH) for robust electrical performance
有权
同轴电镀通孔(PTH),用于坚固的电气性能
- Patent Title: Coaxial plated through holes (PTH) for robust electrical performance
- Patent Title (中): 同轴电镀通孔(PTH),用于坚固的电气性能
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Application No.: US12347600Application Date: 2008-12-31
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Publication No.: US08227706B2Publication Date: 2012-07-24
- Inventor: Mihir Roy , Mahadevan Suryakumar , Yonggang Li
- Applicant: Mihir Roy , Mahadevan Suryakumar , Yonggang Li
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: H05K1/11
- IPC: H05K1/11

Abstract:
In some embodiments, coaxial plated through holes (PTH) for robust electrical performance are presented. In this regard, an apparatus is introduced comprising an integrated circuit device and a substrate coupled with the integrated circuit device, wherein the substrate includes: a plated through hole, the plated through hole filled with dielectric material and a coaxial copper wire, and conductive traces to separately route the plated through hole and the coaxial copper wire. Other embodiments are also disclosed and claimed.
Public/Granted literature
- US20100163295A1 COAXIAL PLATED THROUGH HOLES (PTH) FOR ROBUST ELECTRICAL PERFORMANCE Public/Granted day:2010-07-01
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