Invention Grant
- Patent Title: Debris prevention system and lithographic apparatus
- Patent Title (中): 防碎片系统和光刻设备
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Application No.: US11878306Application Date: 2007-07-23
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Publication No.: US08227771B2Publication Date: 2012-07-24
- Inventor: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: A61N5/00
- IPC: A61N5/00

Abstract:
A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
Public/Granted literature
- US20090027637A1 Debris prevention system and lithographic apparatus Public/Granted day:2009-01-29
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