Invention Grant
- Patent Title: Resistance change element and method of manufacturing the same
- Patent Title (中): 电阻变化元件及其制造方法
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Application No.: US12487214Application Date: 2009-06-18
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Publication No.: US08227782B2Publication Date: 2012-07-24
- Inventor: Hideyuki Noshiro
- Applicant: Hideyuki Noshiro
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: WOPCT/JP2006/325295 20061219
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L47/00

Abstract:
In a resistance change memory (ReRAM) storing data by utilizing change in resistance of a resistance change element, a lower electrode (ground-side electrode) of the resistance change element is formed of a transition metal such as Ni, and an upper electrode (positive polarity-side electrode) is configured of a noble metal such as Pt. In addition, a transition metal oxide film between the lower electrode and the upper electrode is formed of an oxide film (NiOx film) of a transition metal that is of the same kind as the transition metal constituting the lower electrode, for example.
Public/Granted literature
- US20090257271A1 RESISTANCE CHANGE ELEMENT AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-10-15
Information query
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