Invention Grant
- Patent Title: Integrated circuit device and method of forming the same
- Patent Title (中): 集成电路装置及其形成方法
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Application No.: US12954284Application Date: 2010-11-24
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Publication No.: US08227840B2Publication Date: 2012-07-24
- Inventor: Charles C. Wang , Shing Hwa Renn , Sheng Kang Luo
- Applicant: Charles C. Wang , Shing Hwa Renn , Sheng Kang Luo
- Applicant Address: TW
- Assignee: Nanya Technology Corp.
- Current Assignee: Nanya Technology Corp.
- Current Assignee Address: TW
- Agency: Connolly Bove Lodge & Hutz LLP
- Main IPC: H01L29/80
- IPC: H01L29/80

Abstract:
An integrated circuit device includes a semiconductor substrate having a first region and second region, a conductive via positioned in the first region of the semiconductor substrate, at least one active element positioned in the second region of the semiconductor substrate, a conductive layer extending from the first region to the second region and electrically connecting the conductive via to the active element, and an auxiliary structure positioned in the first region of the semiconductor substrate and proximate to the conductive via. The auxiliary structure can be a stress-absorbing structure, and the volume of the stress-absorbing structure decreases as the volume of the conductive via increases. The auxiliary structure can be a heat-evacuating structure, and the heat-evacuating structure is configured to transfer the operating heat generated by the active element from the first region of the semiconductor substrate to the conductive via through the conductive layer.
Public/Granted literature
- US20120126412A1 INTEGRATED CIRCUIT DEVICE AND METHOD OF FORMING THE SAME Public/Granted day:2012-05-24
Information query
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