Invention Grant
- Patent Title: Semiconductor integrated circuit devices having conductive patterns that are electrically connected to junction regions
- Patent Title (中): 具有电连接到结区域的导电图案的半导体集成电路器件
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Application No.: US12912976Application Date: 2010-10-27
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Publication No.: US08227853B2Publication Date: 2012-07-24
- Inventor: Bong-Hyun Lee , Jung-Yun Choi
- Applicant: Bong-Hyun Lee , Jung-Yun Choi
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2007-0066181 20070702
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A semiconductor integrated circuit device includes a semiconductor substrate; a dummy pattern extending in one direction on the semiconductor substrate; a junction region electrically connecting the dummy pattern to the semiconductor substrate; and a voltage applying unit that is configured to apply a bias voltage to the dummy pattern.
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Information query
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