Invention Grant
- Patent Title: CMOS semiconductor device
- Patent Title (中): CMOS半导体器件
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Application No.: US12657948Application Date: 2010-01-29
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Publication No.: US08227864B2Publication Date: 2012-07-24
- Inventor: Yoshiaki Kikuchi
- Applicant: Yoshiaki Kikuchi
- Applicant Address: JP
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: JPP2009-026674 20090206
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
The invention provides a semiconductor device capable of suppressing a short channel effect and fluctuation in a threshold. The semiconductor device includes: a plurality of first transistors formed in a first region in a semiconductor layer in a multilayer substrate having, on a semiconductor substrate, an insulating layer and the semiconductor layer in order from the semiconductor substrate; a plurality of second transistors formed in a second region in the semiconductor layer; a first impurity layer formed in a region opposed to the first region in the semiconductor substrate; a second impurity layer formed in a region opposed to the second region in the semiconductor substrate; and a first isolation part that isolates the first and second regions from each other and electrically isolates the first and second impurity layers from each other to a degree that at least current flowing between the first and second impurity layers is interrupted.
Public/Granted literature
- US20100200919A1 Semiconductor device Public/Granted day:2010-08-12
Information query
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