Invention Grant
- Patent Title: Pattern aligning method, verifying method, and verifying device
- Patent Title (中): 模式对齐方法,验证方法和验证设备
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Application No.: US12368506Application Date: 2009-02-10
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Publication No.: US08229250B2Publication Date: 2012-07-24
- Inventor: Tomoharu Suzuki , Shinichi Eguchi
- Applicant: Tomoharu Suzuki , Shinichi Eguchi
- Applicant Address: JP Kawasaki JP Tokyo
- Assignee: Fujitsu Limited,Fujitsu Frontech Limited
- Current Assignee: Fujitsu Limited,Fujitsu Frontech Limited
- Current Assignee Address: JP Kawasaki JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2008-93476 20080331
- Main IPC: G06K9/40
- IPC: G06K9/40

Abstract:
A pattern alignment method performs alignment of the comparison source pattern or the comparison target pattern that has been subjected to the angle-scale conversion with the comparison source pattern. Angular deviations and scale factors between the comparison source pattern and the comparison target pattern are computed separately, after angle and scale conversion, the measured template matching is performed. Therefore, parallel-displacement alignment can be made faster and precise alignment is possible. Template matching processing can be minimized, and aligning can be performed precisely and rapidly.
Public/Granted literature
- US20090245593A1 PATTERN ALIGNING METHOD, VERIFYING METHOD, AND VERIFYING DEVICE Public/Granted day:2009-10-01
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