Invention Grant
- Patent Title: Methods for self-aligned self-assembled patterning enhancement
- Patent Title (中): 自对准自组装图案增强方法
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Application No.: US13010326Application Date: 2011-01-20
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Publication No.: US08232211B1Publication Date: 2012-07-31
- Inventor: Larry Clevenger , Timothy J. Dalton , Carl J. Radens
- Applicant: Larry Clevenger , Timothy J. Dalton , Carl J. Radens
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Richard M. Kotulak
- Main IPC: H01L21/311
- IPC: H01L21/311
Abstract:
Methods for producing self-aligned, self-assembled sub-ground-rule features without the need to use additional lithographic patterning. Specifically, the present disclosure allows for the creation of assist features that are localized and self-aligned to a given structure. These assist features can either have the same tone or different tone to the given feature.
Public/Granted literature
- US20120190205A1 METHODS FOR SELF-ALIGNED SELF-ASSEMBLED PATTERNING ENHANCEMENT Public/Granted day:2012-07-26
Information query
IPC分类:
