Invention Grant
- Patent Title: Lithographic apparatus and substrate edge seal
- Patent Title (中): 平版印刷设备和基板边缘密封
-
Application No.: US13184152Application Date: 2011-07-15
-
Publication No.: US08232540B2Publication Date: 2012-07-31
- Inventor: Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
- Applicant: Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03B27/52
Abstract:
A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
Public/Granted literature
- US20110267592A1 LITHOGRAPHIC APPARATUS AND SUBSTRATE EDGE SEAL Public/Granted day:2011-11-03
Information query
IPC分类:
