Invention Grant
- Patent Title: Composition and method for low temperature deposition of silicon-containing films
- Patent Title (中): 含硅薄膜低温沉积的组成和方法
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Application No.: US13028193Application Date: 2011-02-15
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Publication No.: US08236097B2Publication Date: 2012-08-07
- Inventor: Ziyun Wang , Chongying Xu , Thomas H. Baum , Bryan C. Hendrix , Jeffrey F. Roeder
- Applicant: Ziyun Wang , Chongying Xu , Thomas H. Baum , Bryan C. Hendrix , Jeffrey F. Roeder
- Applicant Address: US CT Danbury
- Assignee: Advanced Technology Materials, Inc.
- Current Assignee: Advanced Technology Materials, Inc.
- Current Assignee Address: US CT Danbury
- Agency: Hultquist, PLLC
- Agent Steven J. Hultquist; Maggie Chappuis
- Main IPC: C09D5/00
- IPC: C09D5/00 ; C07F7/02 ; C23C16/40

Abstract:
This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g.,
Public/Granted literature
- US20110136343A1 COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS Public/Granted day:2011-06-09
Information query
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