Invention Grant
US08236133B2 Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias
失效
具有中心馈送多区域气体分布的等离子体反应器，用于改善临界尺寸偏差的均匀性
- Patent Title: Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias
- Patent Title (中): 具有中心馈送多区域气体分布的等离子体反应器，用于改善临界尺寸偏差的均匀性
-
Application No.: US12143092Application Date: 2008-06-20
-
Publication No.: US08236133B2Publication Date: 2012-08-07
- Inventor: Dan Katz , David Palagashvili , Brian K. Hatcher , Theodoros Panagopoulos , Valentin N. Todorow , Edward P. Hammond, IV , Alexander M. Paterson , Rodolfo P. Belen
- Applicant: Dan Katz , David Palagashvili , Brian K. Hatcher , Theodoros Panagopoulos , Valentin N. Todorow , Edward P. Hammond, IV , Alexander M. Paterson , Rodolfo P. Belen
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: H01L21/311
- IPC: H01L21/311
Abstract:
A gas distribution assembly for the ceiling of a plasma reactor includes a center fed hub and an equal path length distribution gas manifold underlying the center fed hub.
Public/Granted literature
Information query
IPC分类:
