Invention Grant
US08236419B2 Amorphous silicon-containing material with hierarchical and organized porosity
有权
无定形含硅材料具有分层和有组织的孔隙度
- Patent Title: Amorphous silicon-containing material with hierarchical and organized porosity
- Patent Title (中): 无定形含硅材料具有分层和有组织的孔隙度
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Application No.: US12676759Application Date: 2008-08-19
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Publication No.: US08236419B2Publication Date: 2012-08-07
- Inventor: Alexandra Chaumonnot , Stephanie Pega , Clement Sanchez , Cedric Boissiere
- Applicant: Alexandra Chaumonnot , Stephanie Pega , Clement Sanchez , Cedric Boissiere
- Applicant Address: FR Rueil-Malmaison Cedex
- Assignee: IFP Energies nouvelles
- Current Assignee: IFP Energies nouvelles
- Current Assignee Address: FR Rueil-Malmaison Cedex
- Agency: Millen, White, Zelano & Branigan, P.C.
- Priority: FR0706297 20070907
- International Application: PCT/FR2008/001199 WO 20080819
- International Announcement: WO2009/056711 WO 20090507
- Main IPC: B32B5/66
- IPC: B32B5/66
Abstract:
Material with hierarchical porosity consisting of at least two elementary spherical particles, each one of said particles comprising a matrix based on silicon oxide, mesostructured, having a mesopore diameter ranging between 1.5 and 30 nm and exhibiting amorphous and microporous walls of thickness ranging between 1.5 and 50 nm, said elementary spherical particles having a maximum diameter of 200 microns. The matrix based on silicon oxide can contain aluminium. The preparation of said material is also described.
Public/Granted literature
- US20100291387A1 AMORPHOUS SILICON-CONTAINING MATERIAL WITH HIERARCHICAL AND ORGANIZED POROSITY Public/Granted day:2010-11-18
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