Invention Grant
- Patent Title: Antireflection structure and manufacturing method thereof
- Patent Title (中): 防反射结构及其制造方法
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Application No.: US12238652Application Date: 2008-09-26
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Publication No.: US08236433B2Publication Date: 2012-08-07
- Inventor: Po-Kai Chiu , Wen-Hao Cho , Hung-Ping Chen , Han-Chang Pan , Chien-Nan Hsiao
- Applicant: Po-Kai Chiu , Wen-Hao Cho , Hung-Ping Chen , Han-Chang Pan , Chien-Nan Hsiao
- Applicant Address: TW Taipei
- Assignee: National Applied Research Laboratories
- Current Assignee: National Applied Research Laboratories
- Current Assignee Address: TW Taipei
- Agency: Volpe and Koenig, P.C.
- Priority: TW97110886A 20080326
- Main IPC: B32B15/01
- IPC: B32B15/01 ; C23C28/00

Abstract:
An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.
Public/Granted literature
- US20090246514A1 ANTIREFLECTION STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-10-01
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