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US08236433B2 Antireflection structure and manufacturing method thereof 有权
防反射结构及其制造方法

Antireflection structure and manufacturing method thereof
Abstract:
An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.
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