Invention Grant
- Patent Title: Semiconductor light emitting element and method for manufacturing the same
- Patent Title (中): 半导体发光元件及其制造方法
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Application No.: US12670631Application Date: 2008-07-31
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Publication No.: US08236591B2Publication Date: 2012-08-07
- Inventor: Takashi Ichihara , Hirofumi Yoshida , Takao Yamada , Yohei Wakai
- Applicant: Takashi Ichihara , Hirofumi Yoshida , Takao Yamada , Yohei Wakai
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Global IP Counselors, LLP
- Priority: JP2007-203353 20070803; JP2007-203359 20070803
- International Application: PCT/JP2008/063735 WO 20080731
- International Announcement: WO2009/020033 WO 20090212
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08

Abstract:
A method for manufacturing a semiconductor light emitting element from a wafer in which a gallium nitride compound semiconductor has been laminated on a sapphire substrate having an orientation flat, comprises of: laminating a semiconductor layer on a first main face of the sapphire substrate having an off angle θ in a direction Xo parallel to the orientation flat; forming a first break groove that extends in a direction Y substantially perpendicular to the direction Xo, on the semiconductor layer side; forming a second break line that is shifted by a predetermined distance in the ±Xo direction from a predicted split line within the first break groove and parallel to the first break groove in the interior of the sapphire substrate and corresponding to the inclination of the off angle θ; and splitting the wafer along the first and/or second break line.
Public/Granted literature
- US20100187542A1 SEMICONDUCTOR LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-07-29
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