Invention Grant
- Patent Title: Solution-based process for making inorganic materials
- Patent Title (中): 制备无机材料的基于溶液的工艺
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Application No.: US12798755Application Date: 2010-04-09
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Publication No.: US08236599B2Publication Date: 2012-08-07
- Inventor: Chih-hung Chang , Wei Wang
- Applicant: Chih-hung Chang , Wei Wang
- Applicant Address: US OR Corvallis
- Assignee: State of Oregon acting by and through the State Board of Higher Education
- Current Assignee: State of Oregon acting by and through the State Board of Higher Education
- Current Assignee Address: US OR Corvallis
- Agency: Klarquist Sparkman, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Disclosed embodiments provide a solution-based process for producing useful materials, such as semiconductor materials. One disclosed embodiment comprises providing at least a first reactant and a second reactant in solution and applying the solution to a substrate. The as-deposited material is thermally annealed to form desired compounds. Thermal annealing may be conducted under vacuum; under an inert atmosphere; or under a reducing environment. The method may involve using metal and chalcogen precursor compounds. One example of a metal precursor compound is a metal halide. Examples of suitable chalcogen precursor compounds include a chalcogen powder, a chalcogen halide, a chalcogen oxide, a chalcogen urea, a chalcogen or dichalcogen comprising organic ligands, or combinations thereof. Certain disclosed embodiments concern a method for making a solar cell from I-III-VI semiconductors.
Public/Granted literature
- US20100261304A1 Solution-based process for making inorganic materials Public/Granted day:2010-10-14
Information query
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