Invention Grant
US08237085B2 Beam homogenizer, laser irradiation apparatus, and laser irradiation method
有权
光束均化器,激光照射装置和激光照射方法
- Patent Title: Beam homogenizer, laser irradiation apparatus, and laser irradiation method
- Patent Title (中): 光束均化器,激光照射装置和激光照射方法
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Application No.: US11939649Application Date: 2007-11-14
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Publication No.: US08237085B2Publication Date: 2012-08-07
- Inventor: Koichiro Tanaka
- Applicant: Koichiro Tanaka
- Applicant Address: JP Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-Ken
- Agency: Nixon Peabody, LLP
- Agent Jeffrey L. Costellia
- Priority: JP2006-311077 20061117
- Main IPC: B23K26/06
- IPC: B23K26/06

Abstract:
An effect of interference is eliminated and intensity of a laser beam is homogenized. The beam homogenizer 100 includes reflecting mirrors 103 and 104 which are provided so that reflecting surfaces thereof face each other. The laser beam LB propagates through a space between the reflecting mirrors 103 and 104 while being reflected therebetween, so that intensity distribution of the laser beam LB is homogenized, but the laser beam LB also interferes. The first reflecting mirror 103 and the second reflecting mirror 104 are oscillated in a direction perpendicular to a direction in which the laser beam LB is scanned, intensity distribution of the laser beam LB in an oscillation direction is temporally averaged.
Public/Granted literature
- US20080118203A1 BEAM HOMOGENIZER, LASER IRRADIATION APPARATUS, AND LASER IRRADIATION METHOD Public/Granted day:2008-05-22
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