Invention Grant
- Patent Title: Energy sources for curing in an imprint lithography system
- Patent Title (中): 在压印光刻系统中固化的能源
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Application No.: US12511593Application Date: 2009-07-29
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Publication No.: US08237133B2Publication Date: 2012-08-07
- Inventor: Mahadevan Ganapathisubramanian , Byung-Jin Choi , Liang Wang , Alex Ruiz
- Applicant: Mahadevan Ganapathisubramanian , Byung-Jin Choi , Liang Wang , Alex Ruiz
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: G21K5/00
- IPC: G21K5/00
Abstract:
Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate.
Public/Granted literature
- US20100090130A1 Energy Sources for Curing in an Imprint Lithography System Public/Granted day:2010-04-15
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