Invention Grant
- Patent Title: Semiconductor device with vertical channel transistor
- Patent Title (中): 具有垂直沟道晶体管的半导体器件
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Application No.: US12776318Application Date: 2010-05-07
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Publication No.: US08237220B2Publication Date: 2012-08-07
- Inventor: Min-Gyu Sung , Heung-Jae Cho , Yong-Soo Kim , Kwan-Yong Lim , Se-Aug Jang
- Applicant: Min-Gyu Sung , Heung-Jae Cho , Yong-Soo Kim , Kwan-Yong Lim , Se-Aug Jang
- Applicant Address: KR Icheon-si
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Icheon-si
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: KR10-2007-0111632 20071102
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
In a high speed vertical channel transistor, a pillar structure is formed over a substrate, a gate electrode surrounds an outer wall of a lower portion of the pillar structure; and a word line extends in a direction to partially contact an outer wall of the gate electrode. The word line shifts toward a side of the pillar structure resulting in increased transistor speed.
Public/Granted literature
- US20100219466A1 SEMICONDUCTOR DEVICE WITH VERTICAL CHANNEL TRANSISTOR Public/Granted day:2010-09-02
Information query
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