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US08237220B2 Semiconductor device with vertical channel transistor 有权
具有垂直沟道晶体管的半导体器件

Semiconductor device with vertical channel transistor
Abstract:
In a high speed vertical channel transistor, a pillar structure is formed over a substrate, a gate electrode surrounds an outer wall of a lower portion of the pillar structure; and a word line extends in a direction to partially contact an outer wall of the gate electrode. The word line shifts toward a side of the pillar structure resulting in increased transistor speed.
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