Invention Grant
- Patent Title: Semiconductor device and method of embedding thermally conductive layer in interconnect structure for heat dissipation
- Patent Title (中): 半导体器件和将导热层嵌入互连结构中用于散热的方法
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Application No.: US12507130Application Date: 2009-07-22
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Publication No.: US08237252B2Publication Date: 2012-08-07
- Inventor: Reza A. Pagaila , Byung Tai Do , Linda Pei Ee Chua
- Applicant: Reza A. Pagaila , Byung Tai Do , Linda Pei Ee Chua
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins & Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L23/52
- IPC: H01L23/52

Abstract:
A semiconductor device is made by forming a first thermally conductive layer over a first surface of a semiconductor die. A second surface of the semiconductor die is mounted to a sacrificial carrier. An encapsulant is deposited over the first thermally conductive layer and sacrificial carrier. The encapsulant is planarized to expose the first thermally conductive layer. A first insulating layer is formed over the second surface of the semiconductor die and a first surface of the encapsulant. A portion of the first insulating layer over the second surface of the semiconductor die is removed. A second thermally conductive layer is formed over the second surface of the semiconductor die within the removed portion of the first insulating layer. An electrically conductive layer is formed within the insulating layer around the second thermally conductive layer. A heat sink can be mounted over the first thermally conductive layer.
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