Invention Grant
US08237252B2 Semiconductor device and method of embedding thermally conductive layer in interconnect structure for heat dissipation 有权
半导体器件和将导热层嵌入互连结构中用于散热的方法

Semiconductor device and method of embedding thermally conductive layer in interconnect structure for heat dissipation
Abstract:
A semiconductor device is made by forming a first thermally conductive layer over a first surface of a semiconductor die. A second surface of the semiconductor die is mounted to a sacrificial carrier. An encapsulant is deposited over the first thermally conductive layer and sacrificial carrier. The encapsulant is planarized to expose the first thermally conductive layer. A first insulating layer is formed over the second surface of the semiconductor die and a first surface of the encapsulant. A portion of the first insulating layer over the second surface of the semiconductor die is removed. A second thermally conductive layer is formed over the second surface of the semiconductor die within the removed portion of the first insulating layer. An electrically conductive layer is formed within the insulating layer around the second thermally conductive layer. A heat sink can be mounted over the first thermally conductive layer.
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