Invention Grant
US08238391B2 P-type group III nitride semiconductor and group III nitride semiconductor element
有权
P型III族氮化物半导体和III族氮化物半导体元件
- Patent Title: P-type group III nitride semiconductor and group III nitride semiconductor element
- Patent Title (中): P型III族氮化物半导体和III族氮化物半导体元件
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Application No.: US12532564Application Date: 2008-03-21
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Publication No.: US08238391B2Publication Date: 2012-08-07
- Inventor: Toru Kinoshita , Hiroyuki Yanagi , Kazuya Takada
- Applicant: Toru Kinoshita , Hiroyuki Yanagi , Kazuya Takada
- Applicant Address: JP Shunan-Shi
- Assignee: Tokuyama Corporation
- Current Assignee: Tokuyama Corporation
- Current Assignee Address: JP Shunan-Shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-077449 20070323
- International Application: PCT/JP2008/055277 WO 20080321
- International Announcement: WO2008/117750 WO 20081002
- Main IPC: H01S3/04
- IPC: H01S3/04 ; H01S5/00

Abstract:
This invention provides a p-type group III nitride semiconductor, with good p-type properties, having a composition expressed by AlXGaYInZN in which each of X, Y and Z indicates a rational number satisfying a relationship of X+Y+Z=1.0, even if Al content is as high as 1.0>X≧0.5. It is achieved that a proportion of a hole concentration at 30° C. to an acceptor impurity atom concentration is 0.001 or more in the p-type group III nitride semiconductor of the invention, by doping acceptor impurity atoms such as Mg in concentration of 5×1018 to 1×1020 cm−3 using the method, for example, MOCVD with attention not to incorporate an impurity atom other than the acceptor impurity atom or not to form dislocation in the crystal when producing the group III nitride semiconductor expressed by the above composition.
Public/Granted literature
- US20110128981A1 P-TYPE GROUP III NITRIDE SEMICONDUCTOR AND GROUP III NITRIDE SEMICONDUCTOR ELEMENT Public/Granted day:2011-06-02
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