Invention Grant
US08239786B2 Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
有权
用于光刻处理方法中的光学邻近校正的局部多变量求解器,以及由此制造的器件
- Patent Title: Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
- Patent Title (中): 用于光刻处理方法中的光学邻近校正的局部多变量求解器,以及由此制造的器件
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Application No.: US12644790Application Date: 2009-12-22
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Publication No.: US08239786B2Publication Date: 2012-08-07
- Inventor: William S. Wong , Fei Liu , Been-Der Chen , Yen-Wen Lu
- Applicant: William S. Wong , Fei Liu , Been-Der Chen , Yen-Wen Lu
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix.
Public/Granted literature
- US20100167184A1 LITHOGRAPHIC PROCESSING METHOD, AND DEVICE MANUFACTURED THEREBY Public/Granted day:2010-07-01
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