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US08239786B2 Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby 有权
用于光刻处理方法中的光学邻近校正的局部多变量求解器,以及由此制造的器件

Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
Abstract:
A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix.
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