Invention Grant
- Patent Title: Radiation source and lithographic apparatus including a contamination trap
- Patent Title (中): 辐射源和光刻设备包括污染物陷阱
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Application No.: US12431423Application Date: 2009-04-28
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Publication No.: US08242471B2Publication Date: 2012-08-14
- Inventor: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01J3/10
- IPC: G01J3/10

Abstract:
A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.
Public/Granted literature
- US20090272917A1 RADIATION SOURCE Public/Granted day:2009-11-05
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