Invention Grant
- Patent Title: Method of manufacturing liquid crystal device
- Patent Title (中): 制造液晶装置的方法
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Application No.: US12498641Application Date: 2009-07-07
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Publication No.: US08243249B2Publication Date: 2012-08-14
- Inventor: Shintaro Asuke
- Applicant: Shintaro Asuke
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2008-180393 20080710
- Main IPC: G02F1/13
- IPC: G02F1/13 ; G02F1/1337

Abstract:
A method of manufacturing a liquid crystal device provided with a liquid crystal layer held between a pair of substrates opposed to each other, and an oriented film disposed between at least one of the substrates and the liquid crystal layer, includes: (a) providing an inorganic oriented film to the one of the substrates; (b) forming a first organic film with a first silane-coupling agent, the first organic film randomly covering a surface of the inorganic oriented film with a predetermined coverage factor smaller than 1; and (c) forming, after step (b), a second organic film with a second silane-coupling agent having a carbon number different from a carbon number of the first silane-coupling agent, the second organic film covering the surface exposed from the first organic film, thereby forming the oriented film composed mainly of the first organic film, the second organic film, and the inorganic film.
Public/Granted literature
- US20100006538A1 METHOD OF MANUFACTURING LIQUID CRYSTAL DEVICE Public/Granted day:2010-01-14
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