Invention Grant
US08243268B2 Substrate processing apparatus, optical constant obtaining method, and storage medium storing program executing same
有权
基板处理装置，光学常数获取方法和存储执行相同方案的程序的存储介质
- Patent Title: Substrate processing apparatus, optical constant obtaining method, and storage medium storing program executing same
- Patent Title (中): 基板处理装置，光学常数获取方法和存储执行相同方案的程序的存储介质
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Application No.: US12543697Application Date: 2009-08-19
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Publication No.: US08243268B2Publication Date: 2012-08-14
- Inventor: Toshihiko Kikuchi
- Applicant: Toshihiko Kikuchi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-213074 20080821
- Main IPC: G01J3/00
- IPC: G01J3/00
Abstract:
In a method of obtaining an optical constant of each the films of a film-stacked structure formed on a substrate, a basic process obtains an optical constant of each of the films by successively providing the films one by one as a target film from bottom to top and obtaining an optical constant of the target film by using a previously obtained optical constant of a below-located film that is located below the target film and a re-obtaining process re-obtains the optical constant of each of the films by correcting the previously obtained optical constant of the below-located film and the optical constant of the target film obtained in the basic process.
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