Invention Grant
- Patent Title: Optofluidic lithography system, method of manufacturing two-layered microfluidic channel, and method of manufacturing three-dimensional microstructures
- Patent Title (中): 光电光刻系统,双层微流体通道的制造方法和制造三维微结构的方法
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Application No.: US12555428Application Date: 2009-09-08
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Publication No.: US08246889B2Publication Date: 2012-08-21
- Inventor: Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
- Applicant: Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
- Applicant Address: KR Seoul
- Assignee: SNU R&DB Foundation
- Current Assignee: SNU R&DB Foundation
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2008-0088683 20080909
- Main IPC: B28B7/30
- IPC: B28B7/30

Abstract:
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
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