Invention Grant
US08247033B2 Self-assembly of block copolymers on topographically patterned polymeric substrates
有权
嵌段共聚物在地形图案聚合物基材上的自组装
- Patent Title: Self-assembly of block copolymers on topographically patterned polymeric substrates
- Patent Title (中): 嵌段共聚物在地形图案聚合物基材上的自组装
-
Application No.: US12553484Application Date: 2009-09-03
-
Publication No.: US08247033B2Publication Date: 2012-08-21
- Inventor: Thomas P. Russell , Soojin Park , Dong Hyun Lee , Ting Xu
- Applicant: Thomas P. Russell , Soojin Park , Dong Hyun Lee , Ting Xu
- Applicant Address: US MA Boston US CA Oakland
- Assignee: The University of Massachusetts,The Regents of the University of California
- Current Assignee: The University of Massachusetts,The Regents of the University of California
- Current Assignee Address: US MA Boston US CA Oakland
- Agency: Cantor Colburn LLP
- Main IPC: B05D5/00
- IPC: B05D5/00 ; B05D3/00 ; B23B5/24
Abstract:
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
Public/Granted literature
- US20100075116A1 SELF-ASSEMBLY OF BLOCK COPOLYMERS ON TOPOGRAPHICALLY PATTERNED POLYMERIC SUBSTRATES Public/Granted day:2010-03-25
Information query
