Invention Grant
- Patent Title: Thermal head and manufacturing method for the thermal head
- Patent Title (中): 热敏头及其制造方法
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Application No.: US12804955Application Date: 2010-08-03
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Publication No.: US08253765B2Publication Date: 2012-08-28
- Inventor: Noriyoshi Shoji , Norimitsu Sanbongi , Toshimitsu Morooka , Keitaro Koroishi
- Applicant: Noriyoshi Shoji , Norimitsu Sanbongi , Toshimitsu Morooka , Keitaro Koroishi
- Applicant Address: JP
- Assignee: Seiko Instruments Inc.
- Current Assignee: Seiko Instruments Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2009-183554 20090806
- Main IPC: B41J2/335
- IPC: B41J2/335

Abstract:
Provided is a thermal head (1) including: a substrate body (12) constituted through bonding a flat supporting substrate (13) and a flat upper substrate (11), which are made of a glass material onto each other in a stacked state; a heating resistor (14) formed on a surface of the upper substrate (11); and a protective film (18) that partially covers the surface of the upper substrate (11) including the heating resistor (14) and protects the heating resistor (14), in which a heat-insulating concave portion (32) and thickness-measuring concave portions (34), which are open to a bonding surface between the supporting substrate and the upper substrate (11) and form cavities are provided in the supporting substrate (13), the heat-insulating concave portion (32) is formed at a position opposed to the heating resistor (14), and the thickness-measuring concave portions (34) is formed in a region that is prevented from being covered with the protective film (18). Thus, the thickness of the upper substrate is easily measured without decomposing the thermal head.
Public/Granted literature
- US20110032320A1 Thermal head and manufacturing method for the thermal head Public/Granted day:2011-02-10
Information query
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